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top nozzle in Ion implanter
aluminum nitride ceramics

aluminum nitride (ALN) top nozzle in Ion implanter

Etching nozzles are components used in semiconductor manufacturing to remove unwanted materials from the surface of wafers. Aluminum nitride ceramic etching nozzles are highly wear-resistant, corrosion-resistant, and highly accurate, and are capable of working stably for long periods of time in high-temperature, high-pressure, and high-corrosive environments, improving etching results and nozzle service life.

 

Unlike other manufacturers' machining methods, we make aluminum nitride etching nozzles by injection molding process, which has the following advantages:

1.Can make complex shapes
2.High production quantities
3.Excellent performance
4.Low cost

  • Item No :

    Aluminum nitride top nozzle in Ion implanter
  • Size :

    φ62.75*28.7mm
  • Order(MOQ) :

    10pcs
  • Lead Time :

    30~40 days

Aluminum nitride etching nozzles in semiconductor applications

Aluminum nitride etching nozzle in the semiconductor application is mainly reflected in its high wear resistance, high corrosion resistance and high precision characteristics, these characteristics make it possible to work under high temperature, high pressure and high corrosion environment for a long time, improve the etching effect and nozzle life.

Aluminum nitride etching nozzle design and manufacture is to meet the semiconductor manufacturing process of material removal of high precision requirements. In the etching process of semiconductor equipment, the etching nozzle is responsible for removing unwanted material from the wafer surface to achieve precise patterning. Since the semiconductor manufacturing process requires high material purity and precision, the choice of material for the etching nozzle is critical. Aluminum nitride is one of the ideal materials for manufacturing etch nozzles due to its excellent physical and chemical properties.

Advantages of aluminum nitride etching nozzles include:

High abrasion resistance: able to resist high-speed particle impact and friction, maintaining sharp edges over time to ensure accurate etching.

High corrosion resistance: able to work stably in harsh environments such as strong acids and alkalis, preventing corrosion and ensuring the long-term stable operation of the equipment.

High precision: The high precision characteristics of aluminum nitride enable the etching nozzle to accurately control the amount of material removed, thus improving the quality and performance of semiconductor products.

In addition, aluminum nitride etching nozzle also has high thermal stability and good electrical insulation, can maintain stable physical and chemical properties at high temperature, high pressure environment, to ensure the stability and reliability of the semiconductor manufacturing process. These characteristics make the aluminum nitride etching nozzle an indispensable key component in semiconductor manufacturing, which is of great significance for improving production efficiency and product quality.

top nozzle in ion implanter

                                                                              Data Sheet

Properties Condition Units AN-170I
Density --

g/cm3

3.32
Thermal conductivity 25℃

W/m·K

170
Bending strength 3-point method,25

MPa

410
Insulation 25℃

KV/mm

31
Volume resistity 25℃

Ω·cm

4.96×1014
Dielectric constant 1MHz

— —

8.8
Dielectric loss 1MHz

— —

6.6×10-4
CTE 25~400

×10-6/K

4.6

 

Our advantage

Xiamen Juci Company has a plant area of 30,000 square meters, and the production workshop is equipped with 30 sets of single sintering furnaces, as well as 8 sets of advanced continuous sintering furnaces, with a production capacity of up to 1,000 tons/year of aluminum nitride powder. The testing center is about 800 square meters, equipped with more than 100 sets of professional powder and ceramics testing equipments such as scanning electron microscope, particle size meter, nitrogen-oxygen analyzer, powder comprehensive tester, thermal conductivity meter and so on. The company has a R&D center with an area of 1200 square meters, equipped with more than 40 sets of R&D special equipment, and a R&D team of more than 30 people who constantly promote product optimization and innovation, so that the company can maintain its competitive advantage in the fierce market competition.

 

Company Production Line

xiamen juci company factory

 

ISO Cetrificate

xiamen juci companyxiamen juci company

 

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